Lithographic method for production of complete microstructures with a possibility of the spectral modification

Representative No: P1100461
Type of IP: Patent
Industry: Industrial machining

Outline
The present invention relates to a novel kind of microstructuring method. In particular, the present invention relates to a method to modify and optionally also to engineer structural spectra, i.e. mainly absorption and/or emission spectra of solid materials, especially of metals, in a controlled manner. Specifically, the subject matter of the present invention is a novel lithographic method, by means of which complex microstructures of predefined spectra can be fabricated in at least one, more preferably in at least two spatial directions within a region of relatively large physical dimension.

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